Central Facilities

Optical lithography system (located inside cleanroom) equipped with 390 nm laser, which can be used for multiple layer designing on substrate as well as for mask writing.

Optical lithography system (located inside cleanroom) equipped with 405 nm laser, which can be used for multiple layer designing on substrate as well as for mask writing.

Physical properties measurement system (PPMS) (liquid Helium temperature, 2 K) aided with a 9 T superconducting magnet (Wet system) and vibrating sample magnetometer (VSM) with the capability to measure from 10-5 emu to 30 emu.

Electron beam lithography system (located inside cleanroom) with 30 KeV EHT with a minimum feature size achievable 20 nm.

Physical properties measurement system (PPMS) (liquid Helium temperature, 2 K) aided with a 14 T superconducting magnet (Wet system).

SQUID magnetometer (2 K and 8 T); Can measure from 10-8 emu to 2 emu.