Lab Facilities

Pulsed Laser Deposition system with an excimer laser source (248 nm), three high vacuum chambers (10-6 mbar) (one equipped with RHEED) and one ultra high vacuum chamber.

Electron beam evaporation system equipped with electron beam evaporation source with UHV chamber (10-11 mbar)

Electron beam evaporator system

Closed cycle refrigerator system with rotating magnet stage; It can reach up to 5 K.

Magneto optical Kerr effect (MOKE) microscope with inhouse built magnet

Room temperature vibrating sample magnetometer (VSM) system With nano emu accuracy; maximum accessible field 2.1 T.

In-house built Kerr system.

In-house built Quadratic-MOKE (QMOKE) system.

Oxford cryostat (liquid Helium temperature, 2 K) aided with a 8 T superconducting magnet. (Wet system)

In-house developed Magnetron sputtering system (located inside cleanroom) which is optimized for ultrathin film deposition. The system is equipped with two Sputtering chambers supported by load lock system. Both DC and RF sputtering can be done. Typical growth rate is ~ 0.2-0.6 A/sec.

Dilution Refrigerator; minimum temperature achievable is 20 milli Kelvin with 9 T magnetic field in z-direction and 1 T vector magnet.

Argon Ion beam Etching unit (located inside cleanroom) developed and optimized to minimize edge roughness of pattered thin films.

Set up for growing nanowires using VLS method

Pallet maker

Single zone furnaces with PID controller used for growing single crystal Using vertical Bridgeman mehtod

Dual zone furnace with PID controller for for growing single crystal Using chemical vapor transport mehtod

Globe box filled with Argon gas, with O2 level < 0.1 ppm; equipped with a dry transfer set up.